Horizontal Silicon Carbide Deposition Furnace

Product Description

1. Product picture

2. Product introduction
Horizontal silicon carbide deposition furnace equipment is mainly used for the production of high-quality silicon carbide CVD vapor deposition products. Can achieve full automatic control, one key to complete; Safe and reliable, fast cooling speed.

3. Technical parameters

Main indicators and parameters of the equipment
Common working temperature		1100ºC~1300ºC
Maximum temperature		1400ºC
Rated power		450kW
Temperature stability of constant temperature section		±1ºC/24h
Product outlet temperature		<80ºC